27.09.2016

Zeiss Leo 1430

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Zeiss Leo 1430 E-beam lithography & Scanning Electron Microscope (SEM) equipment 

 LEO1430.jpg

Zeiss Leo 1430 scanning electron microscope (SEM) & E-beam lithography setup.

Name and Model (Year of Manufacture / Installation)

Zeiss Leo 1430 (2000/2000)

General Information

Scanning electron microscope (SEM) + e-beam lithography. High resolution electron beam workstation. Nanostructures patterning on e-beam resists. Imaging.

Key Specifications       

Maximum resolution: 3,5 μm

Acceleration voltage: 200V … 30 kV

Magnification: 15x … 300 000x

Probe current: 10-12 - 10-7 A

Beam blanker: Electrostatic

Stage max. movements X,Y,Z and R,T:  100, 125, 35 and 360, 90

Key Features
  • Electron gun: LaB6
  • Turbo / Ion pump
  • Detector: SE
  • Pattern generator: Elphy Quantum
Location, Responsible Person 

Nanoscience Center, Clean room / Kimmo Kinnunen