Nanoscribe Photonic Professional

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Nanoscribe Photonic Professional


Nanoscribe 3D lithography device.

Name and Model (Year of Manufacture / Installation)

Nanoscribe Photonic Professional (2013/2013)

General Information

3D lithography device. Pattern 3D structures by laser.

Key Specifications    
  • Objective 63x, NA=0.75
  • Several dip-in objectives with various magnifications.
Key Features 

Femtosecond fiber laser

maximum laser power: ≥ 120mW
laser center wavelength: 780 ± 10nm
laser repetition rate: 80MHz

Location, Responsible Person

Nanoscience Center, cleanroom / Kimmo Kinnunen

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